Tanapak Metanawin, Paisan Setasuwan, and Narongrit Sombatsompop

pp. 259 - 268

Abstract

Diamond film growth was studied using chemical vapor deposition (CVD). A special equipment was
build in-house, employing a welding torch, and substrate holder with a water-cooling system. Acetylene and
oxygen were used as combustion gases and the substrate was tungsten carbide cobalt. It was found that
surface treatments, such as diamond powder scratching or acid etching, increase the adhesion and prevent
the film peel-off. Diamond powder scratching and combined diamond powder scratching with acid etching
gave the similar diamond film structure with small grain and slightly rough surface. The diamond film
obtained with both treatments has high adhesion and can withstand internal stress better than ones obtained
by untreated surface or acid etching alone. It was also found that higher substrate temperature produced
smoother surface and more uniform diamond grain.